Phase Retarding Mirror – Si Substrates

- Changes state of polarization or maintains polarization ellipticity
- Improves beam focus
Phase retarding mirrors have an all-dielectric coating on a Silicon substrate. The coating has a distinct control over the relative phase between the incident and outgoing waves. They are intended for use with Carbon Dioxide lasers operating at 10.6 um. Retardation of 45° changes a linearly polarized input to a circularly polarized output. This will provide improved beam focusing capability. If a given state of polarization must be maintained throughout an optical chain, then 0° retardation mirrors should be selected. These will not change the state of polarization of the incoming beam on reflection. To rotate the plane of linear polarization by 90° choose the 90° phase retardation mirrors. These mirrors are intended for use at 45° angle of incidence.
Material: |
Silicon |
Design Wavelength: |
10.6 µm @ 45deg AOI |
Surface Flatness: |
< λ / 20 @ 10.6 µm |
Surface Quality: |
Side 1: < 40 / 20
Side 2: Fine Ground |
Wedge: |
< 3 arc min |
Diameter Tolerance: |
< + 0 / – 0.008″ |
Thickness Tolerance: |
<± 0.010″ |
Clear Aperture: |
> 85% of diameter |
Bevel: |
0.3 mm (typical) x 45° |
Reflectance: |
R> 98.5% |
Retardation: |
0: 0° ± 3°
λ / 4: 90° ± 2° |
Absorption: |
< 0.4% |